| 摘要 |
PROBLEM TO BE SOLVED: To inexpensively produce a phase shift type diffraction grating transfer mask having excellent single mode selectivity with good reproducibility by forming first transfer mask patterns, coating prescribed regions with photoresist patterns, removing the first transfer mask patterns of the non-coated regions and forming second transfer mask patterns. SOLUTION: The photoresist is applied by spinner coating application on a quartz glass substrate 1 having a first light shielding layer 2. Next, the photoresist is subjected to interference exposure by using an Ar ion laser 4 to obtain the photoresist patterns 3. The first transfer mask patterns 5 are formed with the periodic photoresist patterns as a mask. Next, the ordinary photoresist patterns 7 are formed in the prescribed regions and the exposed first transfer mask patterns 5 are peeled from the quartz glass substrate 1 and in succession, the photoresist patterns 7 are peeled. The second transfer mask patterns 9 are then formed and the phase shift type diffraction grating transfer mask is obtd. |
