发明名称 PROCESSING METHOD FOR PHOTOSENSITIVE LITHOGRAPHIC PRINTING PLATE
摘要 PROBLEM TO BE SOLVED: To produce stable antibacterial and antimold effects without increasing cost by using novolak resin in which phenol having antibacterial and antimold effects is left as a binder. SOLUTION: A lid 110 as a hermetically sealing means to stop the circulation of air to the outside is put over a developing tank 102. The lip 110 is a cover formed with a metal, a resin, etc., and the periphery of the lid 110 is hermetically sealed with a hermetically sealing member 111 such as rubber packing so as to enhance the air circulation stopping effect. The lid 110 can be opened so as to carry out maintenance, inspection, etc. The contact of a developer in the developing tank 102 with air is prevented by putting a floating lid 112 on the developer. A photosensitive lithographic printing plate 10 is processed in an automatic processing machine having a hermetically sealed space on the developing tank 102. The photosensitive layer of the printing plate 10 contains 10-90 wt.% novolak resin contg. 0.5-10 wt.% unreacted free phenol.
申请公布号 JPH1138641(A) 申请公布日期 1999.02.12
申请号 JP19970197069 申请日期 1997.07.23
申请人 KONICA CORP 发明人 HIRAI YOKO;SUGI YASUHISA
分类号 G03F7/023;G03F7/00;G03F7/30 主分类号 G03F7/023
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