PRODUCTION OF RELIEF PATTERN

摘要

PROBLEM TO BE SOLVED: To make it possible to form uniform relief patterns to a large area with high accuracy by forming a photosensitive resin layer on a substrate having a surface region where surface roughness is within a specific range and exposing and developing this layer. SOLUTION: A photosensitive film having a base film and the photosensitive resin layer of 100 to 300μm is thickness is honded onto a substrate having the surface region of 3 to 50μm in Rz (ten point average roughness) by directing the photosensitive resin layer surface toward the substrate surface and is then exposed and developed, by which the relief patterns are formed on the substrate. The substrate having the surface region of 3 to 50μm in Rz is a substrate for a rear surface plate of a plasma. display panel provided with electrodes of 3 to 50μm height on a flat glass plate. The photosensitive film is obtd. by applying a soln. of a photosensitive resin compsn. on the base film (polyethylene terephthalate film) of 3 to 100μm thickness and drying the coating, thereby forming the photosensitive resin layer.