| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for forming an MEMS(microelectromechanical system) device capable of facilitating alignment without restricting the composition of film or the constitution of the MEMS device. SOLUTION: The masks with hinge 60 and 70 and the MEMS device 80 are partially formed on a substrate 58 at the same time. Apertures 62 and 72 formed on the masks 60 and 70 regulate a pattern, which is transferred in the form of a pattern layer. After releasing the device 80, the mask 60 is turned by about 180 deg. and arranged on the device 80 so as to be used as a shadow mask of micro size, whereby the optional pattern layer is formed on the device 80. By forming the mask with a hinge by initial-stage lithography, the mask is accurately aligned with the MEMS device. Continuously, the mask 70 is similarly used to form the pattern layer. |
