| 摘要 |
PROBLEM TO BE SOLVED: To accurately and rapidly decide features and dimension of a mask, by objectively and repeatedly measuring the size of other features to decide defect, line width at an arbitrary angle, height of an edge defect and properties of a photomask. SOLUTION: A video inspecting unit 12 has a video camera 20 for inspecting a medium 26, analyzes fine particle, line and size, and outputs a video image of analyzing fine features. The medium 26 is, for example, a glass reticle having a chromium pattern for forming a mask used for manufacturing a semiconductor. A computer system 14 may be a PC computer having a hardware 30, a high resolution monitor 32 and a keyboard 34. A feature measuring system 10 identifies and measures various features such as defect and line width present on the photomask. The defect includes an isolated defect such as a spot or hole, or an edge defect such as projection and penetration. The other feature to be measured includes a width of the chromium line or a marginal width between the lines. |
