| 摘要 |
PROBLEM TO BE SOLVED: To keep resolution high without causing stationary waves and knoching by incorporating a resin raving groups to be decomposed by action of an acid and to be increased in solubility in an alkaline developing solution, and an acid photogenerator and a specified compound. SOLUTION: This photoresist composition contains the resin having the groups to be decomposed by action of the acid and raised in solubility in the alkaline developing solution, the compound to be allowed to generate the acid by irradiation with activated rays or radiation, and the compound represented by the formula in which each of R1 -R4 is an H or halogen atom or a hydroxy, 1-6C alkyl or 6-10 aryl or -C(=O)-R9 group or the like; R9 is an H or halogen atom or a hydroxy or 1-4C alkyl or 6-14C aryl or -O-R14 group or the like; R14 is a 1-5C alkyl or 6-14C aryl group; and each of R5 -R8 is an H atom or a hydroxy or 1-6C alkyl or 6-14C aryl group or the like. |
