PHOTOSENSITIVE POLYIMIDE PRECURSOR COMPOSITION AND PATTERN MANUFACTURING METHOD USING THE SAME

摘要

PROBLEM TO BE SOLVED: To provide a photosensitive polyimide precursor composition superior in photosensitive characteristics and capable of obtaining goof pattern forms even at low exposure and superior in storage stability and also film characteristics obtd. by hardening and to obtain a pattern manufacturing method superior in photosensitive characteristics with 'i' ray and capable of obtaining good pattern forms even at low exposure and obtaining a hardened film superior in film characteristics. SOLUTION: The polyimide precursor composition comprises the photosensitive polyimide precursor having a structural unit represented by formula I (R<1> is a tetravalent organic group; R<2> is a photosensitive group; and R<3> is a divalent organic group), a titanocene compound and a dye compound having absorption in 450-600 nm, and the pattern is formed by irradiating the film made of this composition with 'i' ray through a prescribed pattern mask and developing the film.