摘要 |
The method consists of forming at least one groove (110) in the surface (112) of a first substrate (114), assembling the first substrate with a second substrate (116) which covers the groove and forms a channel, and forming a protective coating on the inside of the channel by thermal oxidation of its walls. The first and second substrates are then cut perpendicular to the channel to form the nozzle (118) for the liquid jet, and the interior protective coating is removed. The two substrates can be machined to form an orifice (140) and/or a reservoir for feeding the nozzles. The first and second substrates are made from silicium, and the inner coating is of silicium oxide, which is removed in a hydrofluoric acid bath. |
申请人 |
COMMISSARIAT A L'ENERGIE ATOMIQUE, PARIS, FR |
发明人 |
FOUILLET, YVES, F-38340 VOREPPE, FR;DELAPIERRE, GILLES, F-38180 SEYSSINS, FR;DELAYE, MARIE-THERESE, F-38100 GRENOBLE, FR |