| 摘要 |
<p>A method and apparatus for cleaning a processing chamber. Steps of the method include flowing a cleaning gas into the chamber, and flowing an inert gas into the chamber during at least a portion of the same time as the cleaning gas, such that the ratio of inert gas to cleaning gas is in a range of about 1:1 to about 1:4 by volume. The apparatus (130) includes a sensor (63) for measuring total pressure in the interior of the chamber (133). Two cleaning gas supplies (59) may be used: a cleaning gas supply (59) with a first valved inlet providing an entrance to the interior of the chamber for passing cleaning gas to the interior of the chamber, and an inert gas supply (57) with a second valved inlet providing an entrance to the interior of the chamber for passing an inert gas to the interior of the chamber. A governor (136) with an input coupled to the sensor maintains the total pressure within the chamber at a prespecified value. First and second mass flow controllers are coupled to the first and second valved inlets, such that the first and second mass flow controllers are set to control the ratio of the amount of cleaning gas entering the chamber to the amount of inert gas entering the chamber so that this ratio is maintained in a range of about 1:1 to about 1:4.</p> |
