Method of and machine for pattern writing by an electron beam

摘要

A method of writing a pattern on the surface of a substrate (13), for example a circuit on a resist-coated wafer, by an electron beam comprises the steps of exposing the substrate surface to an electron beam (12) which is controlled to progressively describe the pattern by stepped movement of a focussed spot of the beam over the surface. The exposure of the surface to the beam is varied by selectably modulating the beam, such as through deflection by deflecting plates (17) to and from a blanking element (16), in the periods between successive movement steps so as to reduce the electron dose in predetermined positions of the beam spot on the surface.