发明名称 ION PLATING DEVICE
摘要 PROBLEM TO BE SOLVED: To generate a stable arc and to prevent the charge-up without using a high frequency power source. SOLUTION: An evaporating source 24 filled with an insulating material 30 is arranged in a vacuum tank whose inside is evacuated, a substrate 34 is arranged at prescribed distance from the evaporating source, an ionization electrode 44 is arranged in the vicinity of the evaporating source between the evaporating source 24 and the substrate 34, and positive voltage is applied thereto by an anode power source 48 with the earth potential as the standard. A thermionic emission electrode 38 is arranged between the evaporating source 24 and the ionization electrode 44, and negative voltage is applied by a filament bias power source 42 with the earth potential as the standard. A pulse power source 36 applies pulse voltage to the substrate 34. This voltage is asymmetric with the earth potential as the standard, the absolute value of the negative voltage is higher than the absolube value of the positive voltage, the frequency thereof is regulated to 10 to 250 kHz, the minimum value of the time to be held by the positive voltage is regulated to 0.1μs, and the maximum value is 40% expressed by the duty ratio.
申请公布号 JPH1136073(A) 申请公布日期 1999.02.09
申请号 JP19970207320 申请日期 1997.07.15
申请人 SHINKO SEIKI CO LTD 发明人 TERAYAMA NOBUYUKI
分类号 C23C14/48;C23C14/32;C23C14/54;(IPC1-7):C23C14/48 主分类号 C23C14/48
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