SYSTEM FOR DELIVERING A SUBSTANTIALLY CONSTANT VAPOR FLOW TO A CHEMICAL PROCESS REACTOR

摘要

A vapor delivery system for delivering a vapor-phase reactant to a chemical process reactor (26) at a substantially constant flow rate. The vapor delivery system includes a source of a reactant material (10), means for converting (14) the reactant material to a vapor and for maintaining (18) a predetermined volume of vapor in a vapor phase, a flow controller (20) for providing a controlled flow of the vapor-phase reactant to the process reactor (26), means for detecting (22) a parameter related to the availability of the vapor-phase reactant material to the process reactor from the flow controller, and means responsive (24) to the detection signal for controlling the supply of reactant material to the vapor converter. In one embodiment the parameter is the pressure of the fluid conductance of a control valve (25) within the flow controller. The vapor delivery system of the present invention can operate in either a substantially continuous or a noncontinuous delivery mode.