发明名称 WET TREATMENT DEVICE
摘要 PROBLEM TO BE SOLVED: To easily set a user-desired process by reducing a device length and facilitate the change in the treatment process involved in specification change. SOLUTION: A first board treatment unit 200 for etching treatment, a second board treatment unit 200' for rinse dry and a double cleaning unit 300 are arranged around a board delivery unit 100, which delivers a board 600 to a periphery. A buffer unit, wherein a board 600 is placed temperately, is installed in the double cleaning unit 300.
申请公布号 JPH1126547(A) 申请公布日期 1999.01.29
申请号 JP19970190495 申请日期 1997.06.30
申请人 SUMITOMO PRECISION PROD CO LTD 发明人 MIZUKAWA SHIGERU;MURATA TAKASHI
分类号 H01L21/677;H01L21/027;H01L21/304;H01L21/68;(IPC1-7):H01L21/68 主分类号 H01L21/677
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