| 摘要 |
PROBLEM TO BE SOLVED: To nearly uniform the distribution of the exposure amount within the exposure region by constituting the optical path length within a thin film of synchrotron radiation light passing through the thin film so as to be irregular within the surface of the thin film. SOLUTION: The surface on an incident side of a window frame 38 is worked cylindrically. The center axis of the cylindrical surface is perpendicularly crossed to the center axis of the outgoing side vacuum duct 30, and parallel to the vertical surface. A beryllium thin film 31 is stuck to the cylindrical surface of the window frame 38 by welding or brazing. The beryllium thin film 31 is worked in a cylindrical shape so as to correspond to the cylindrical surface. By bending the beryllium thin film 31 through which synchrotron light is passed, transmitting optical path length can be varied depending on the transmitting position. The transmitting optical path length is varied, and the damping factor of the synchrotron light has the distribution to the cross section vertical to the light axis. By damping the synchrotron light, uniform exposure is made possible. |
