METHOD FOR ADJUSTING IRRADIATION POSITION WITH BEAM, FOREIGN MATTER DETECTING APPARATUS USING LASER BEAM, SCANNING ELECTRON MICROSCOPE AND COMPOSITION ANALYZING APPARATUS

摘要

PROBLEM TO BE SOLVED: To facilitate adjustment of an irradiation position with beams to a stage. SOLUTION: A photodetector 51 for detecting laser beams is set at an XY stage 21 driven in XY directions. A laser light source 32 for making a laser beam irradiate the XY stage 21 and a different photodetector 33 from the photodetector 51 on the XY stage 21 are arranged above the XY stage 21. While a position where the photodetector 51 on the XY stage 21 detects the laser beam from the laser light source 32 is set as a reference position, the XY stage 21 and laser light source 32 are moved relatively. The photodetector 33 detects a scattering light from a wafer when the laser beam irradiates the wafer placed on the XY stage 21, thereby detecting a foreign matter on the wafer.