| 摘要 |
PROBLEM TO BE SOLVED: To obtain an inspection device by which position information or the like on the direction of an optical axis on the surface of a wafer is detected with high accuracy and by which a high-integration-degree device can be manufactured easily by a method wherein a pattern which is formed by a pattern generator is projected on an object face from an oblique direction. SOLUTION: In a projection optical system 23, a pattern which is formed by a pattern generator is projected on an object face from an oblique direction, and a pattern image is formed on the object face. In a light-receiving optical system, a light-receiving element detects light from the pattern image. That is to say, by using respective face detecting devices 1 to 5, 11 to 16, 19, face-position information on a wafer 6 is detected. Thereby, the height in the direction of the optical axis of the projection optical system 23 in the face position of the wafer 6 is set to a conjugate relationship with a reticle 21 regarding the projection optical system 23. Then, a stage 10 is driven and controlled by a driver 25 in such a way that the wafer 6 is situated in the best image formation face of the projection optical system 23. Thereby, position information and inclination information on the direction of an optical axis on the surface of the wafer 6 are detected with high accuracy, and the wafer 6 can be situated in the image formation position of the projection optical system 23. |
