| 摘要 |
PROBLEM TO BE SOLVED: To provide an apparatus for measuring pattern positions which is capable of precisely measuring, even when dimensions of objects to be measured differ from each other. SOLUTION: An apparatus for measuring pattern positions is provided with a first two-dimensional photoelectric conversion means 12 (a first CCD camera) having relatively large visual field and relatively low resolution, a second two-dimensional photoelectric conversion portion 22 (a second CCD camera) having a relatively small visual field and relatively high resolution, an image-forming portion (an image-forming lens 11, etc.), forming images of patterns to be measured on the first and second two-dimensional photoelectric conversion portions 12, 22 respectively in nearly equal optical magnification, and an image processing portion 30, wherein image data provided by at least one conversion portion between the first and second two-dimensional photoelectric conversion portions 12, 22 is processed so as to calculate the positions of the patterns to be measured or the difference between positions of the patterns to be measured. |
