| 摘要 |
PROBLEM TO BE SOLVED: To easily form a mask having no pattern which is inspected as a pseudodefect by detecting a pattern with possibility to be recognized as a defect by mistake and correcting the pattern with possibility to be recognized as a defect by mistake. SOLUTION: When an acute angle is to be detected, a pattern image is inputted (I) and an acute angle as a pattern with possibility to be recognized as a defect by mistake is detected (II). The sharp angle is corrected by programming in such a manner that a certain side has a specific length on the mask. Therefore, the acute angle as a pattern with possibility to be recognized as a defect by mistake can be removed (III). In the final process, the pattern is outputted (IV) to obtain a mask pattern. Thereby, a pattern having no acute angle can be obtd., and a mask without defect after defect inspection can be obtd. Moreover, not only a mask without a pattern to be detected as a pseudodefects can be obtd., but advantageous effects for easy and free designing of a mask pattern can be obtd. |
