| 摘要 |
PROBLEM TO BE SOLVED: To efficiently and stably vacuum treat by moving wafers between a sub load lock chamber which mounts hermetically a carrier and load lock chamber partitioned by a partition window and carrying the wafers taken out of the carrier. SOLUTION: A carrier 1 hermetically holds a cassette 20 contg. wafers 30, a sub load lock chamber 3 is mounted on the carrier 1 in the held hermetic condition, the chamber 3 for purging the gas in the carrier 1 is partitioned by a partition valve 4, a load lock chamber 2 is partitioned by a partition window 11 from a chamber 50 for vacuum treating the wafers 30, and the wafers 30 are moved between the sub load lock chamber 3 and load lock chamber 2 and those wafers 30 taken out from the carrier 1 are carried to a lift 8. |
