发明名称 COMPACT MICROWAVE DOWNSTREAM PLASMA SYSTEM
摘要 A compact microwave dowstream plasma system includes, within a significantly small portable housing unit, a power supply, a microwave generator, a non-linear wave guide, a circulator, a dummy load, a plasma applicator, and an igniter. The microwave generator supplies microwaves to the guide to the applicator. The guide includes several curved regions that allow for a more compact design. The applicator is configured to generate a plasma and output reactants that can be used to remove photoresist layers from a wafer within a process reactor.
申请公布号 WO9904606(A2) 申请公布日期 1999.01.28
申请号 WO1998US14472 申请日期 1998.07.14
申请人 LAM RESEARCH CORPORATION 发明人 TABREZ, M. SHAMS;CHEW, DWIGHT, C.;STAFFORD, PATRICK, J.;RIDDLE, RICHARD, C.;POLYAK, ALEXANDER, S.
分类号 H01L21/302;H01J37/32;H01L21/3065;H05H1/46 主分类号 H01L21/302
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