发明名称 Integrated photocell array with p-n isolation
摘要 In an integrated photocell array with p-n isolation (5), in which the photocell p-n junctions (2) are irradiated with light, the p-n isolation (5) is protected against the light irradiation (8) preferably by reflective layers (6, 7) which deflect the incident light towards the p-n junctions (2). Preferably, the reflective layers (6, 7) consist of aluminium and only permit entry of light parallel to the planes of the p-n junctions (2). The p-n isolation (5) may be provided with a buried light barrier layer of silicide, especially tungsten silicide. When the photocells consist of emitter-free bipolar transistors operated as photodiodes, a cover may be provided merely for the edge p-n junctions.
申请公布号 DE19730329(A1) 申请公布日期 1999.01.28
申请号 DE19971030329 申请日期 1997.07.15
申请人 SIEMENS AG, 80333 MUENCHEN, DE 发明人 TIHANYI, JENOE, DR.-ING., 85551 KIRCHHEIM, DE;WERNER, WOLFGANG, DR.-ING., 81545 MUENCHEN, DE
分类号 H01L21/761;H01L27/144;H01L31/0232;(IPC1-7):H01L27/144 主分类号 H01L21/761
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