发明名称 |
Integrated photocell array with p-n isolation |
摘要 |
In an integrated photocell array with p-n isolation (5), in which the photocell p-n junctions (2) are irradiated with light, the p-n isolation (5) is protected against the light irradiation (8) preferably by reflective layers (6, 7) which deflect the incident light towards the p-n junctions (2). Preferably, the reflective layers (6, 7) consist of aluminium and only permit entry of light parallel to the planes of the p-n junctions (2). The p-n isolation (5) may be provided with a buried light barrier layer of silicide, especially tungsten silicide. When the photocells consist of emitter-free bipolar transistors operated as photodiodes, a cover may be provided merely for the edge p-n junctions.
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申请公布号 |
DE19730329(A1) |
申请公布日期 |
1999.01.28 |
申请号 |
DE19971030329 |
申请日期 |
1997.07.15 |
申请人 |
SIEMENS AG, 80333 MUENCHEN, DE |
发明人 |
TIHANYI, JENOE, DR.-ING., 85551 KIRCHHEIM, DE;WERNER, WOLFGANG, DR.-ING., 81545 MUENCHEN, DE |
分类号 |
H01L21/761;H01L27/144;H01L31/0232;(IPC1-7):H01L27/144 |
主分类号 |
H01L21/761 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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