SHEET-FORM MAGNETRON SPUTTERING DEVICE

摘要

A sheet-form magnetron sputtering device which can mount a mask on a disk substrate without requiring any complicated mechanism process and can perform sputtering while rotating the substrate around the center axis of the substrate. In the sputtering device, a disk carrying chamber (12) is provided successively to an opening (32) formed through a partition wall (30) constituting the bottom section of a sputtering chamber (11) and the chamber (12), is provided therein with a disk pusher (34) which carries a disk substrate (31) for forming a sputtered film placed on the pusher (34) to the opening (32) of the sputtering chamber (11) and rotates the substrate (31) therein. The sputtering chamber (11), is also provided therein with a rotary center mask (27) which is rotated together with the substrate (31) while the mask (27) is brought into contact with the central part of the upper surface of the substrate (31) placed on the pusher (34).