Verfahren zur Herstellung einer transparenten Silberschicht mit hoher spezifischer elektrischer Leitfähigkeit , Glasscheibe mit einem Dünnschichtsystem mit einer solchen Silberschicht und deren Verwendung

摘要

The invention relates to a process for the production of a thin-layer system with a tranparent silver layer by means of magnetron cathode sputtering, where between the substrate and the silver layer is arranged a lower antireflection layer, which comprises a titanium oxide layer applied directly onto the substrate, and preferably a zinc oxide layer contiguous to the silver layer. To allow for the achievement of silver layers of extremely high specific electrical conductivity the 15-50 nm thick titanium oxide layer is applied by means of medium-frequency sputtering from two titanium cathodes in an oxygen-containing atmosphere onto the substrate and a 2-18 nm thick zinc oxide layer is applied directly onto the titanium oxide layer. The invention is additionally directed to glass panes, including double glazing panes, with such coatings.