Astigmatism-correcting optical system, projection exposure apparatus using the optical system and device manufacturing method

摘要

In a projection exposure apparatus, two plane-parallel plates, which are equal in thickness and refractive index, are interposed between a projection optical system and a wafer. By tilting these two plane-parallel plates at the same angle in opposite directions with respect to the optical axis of the optical system by means of an adjusting device, astigmatism caused in the optical system by exposure is corrected. The amount of astigmatism is calculated by a calculating device based on the amount of light incident on the optical system per unit of time which is obtained according to the output of a light amount sensor.