发明名称 METHOD AND DEVICE FOR TREATING SURFACE OF ROTARY DISK
摘要 PROBLEM TO BE SOLVED: To simply subject both surface of a rotary disk to a cleaning treatment or a polishing treatment. SOLUTION: The rotary disk 10 is positioned at a prescribed position by bringing an outer peripheral surface thereof into contact with positioning rollers 13, 14. A first processing roller 17 coming into contact with one surface of the rotary disk 10 and a second processing roller 18 coming into contact with another surface thereof are arranged at both sides of the rotary disk 10 and these processing rollers 17, 18 are movable with freely approaching/receding from each other. In a condition where the rotary disk 10 is held between both processing rollers 17, 18, different frictional forces are exerted to the rotary disk 10 at one edge part side and at another edge part side of the both processing rollers 17, 18. Thereby processing to the rotary disk surface is executed while rotary motions of the processing rollers 17, 18 are being converted to rotary motion of the rotary disk 10.
申请公布号 JPH1119609(A) 申请公布日期 1999.01.26
申请号 JP19970181966 申请日期 1997.07.08
申请人 SYST SEIKO KK 发明人 IWATA TETSUYA;NAKAZAWA NOBUO
分类号 B08B1/04;B08B7/04;B24D13/02;G11B5/84;G11B23/50;H01L21/304 主分类号 B08B1/04
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