| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide superior optical and mechanical characteristics and to improve the workability by coating the positive type photoresist, which includes dyes in a specific weight percentage, on a substrate, conducting exposing and developing processes to form a desired pattern photoresist layer, irradiating ultraviolet rays and heating the layer. SOLUTION: A photoresist 31, which includes 10 to 50 wt.% of red dye, is coated over the entire surface of a substrate 1 which forms an objective color filter 13. Then, a pattern exposure is conducted against the portion other than the forming section of the color filter base body by a stepper using the (i) line (the wavelength is 365 nm) to form an exposure section 31E which is easily solvable for developer. Then, the photoresist 31 is developed, the section 31E is eliminated and the entire photoresist 31 is irradiated by the ultraviolet rays having the wavelength less than 320 nm with the amount of irradiation less than 20 J/cm<2> . Simultaneously or after a prescribed time is passed from the beginning of the irradiation of ultraviolet rays, the photoresist 31 is irradiated by ultraviolet rays to heat the photoresist 31.</p> |
