| 摘要 |
<p>PROBLEM TO BE SOLVED: To enhance the accuracy of drawing by every beam, by, when the difference between a travel measured with a first laser interferometer and a desired travel and the difference between a travel measured with second laser interferometers and a desired travel are a specific amount, respectively, correcting the irradiation position of a lithography beam in the x direction and in the y direction, accordingly. SOLUTION: Assuming that the distance from a lithography beam irradiation point is L, the rotational angle of laser interferometers and a stage isθ, the angle formed by a line connecting the node of the axes of the measuring beams of a first laser interferometer Ix and second laser interferometers Iy, Iy' and the lithography beam irradiation point, and the x axis isθ, the difference between a travel measured with the first laser interferometer Ix and a desired travel isα, and the difference between a travel measured with the second laser interferometers Iy, Iy' and a desired travel isβ, the irradiation position of the lithography beam is corrected by values equivalent to (α-L.θ.sinγ) in the x direction and equivalent to (β+L.θ.cosγ) in the y direction. As a result, patterns can be drawn with high accuracy.</p> |
