| 摘要 |
<p>PROBLEM TO BE SOLVED: To increase a transmittance of light on a picture element electrodes part on a TFT array substrate and to improve brightness of a display picture on a screen by forming a gate insulating film in a state in which the part under the picture element electrode is removed. SOLUTION: On one transparent substrate, namely, a transparent glass substrate 1a, gate wiring and gate electrode 2 are formed, and a 1st and a 2nd gate insulating film 3, 4 are deposited. After a semiconductor 5 functioning as a switch of TFT 20 has been deposited, an island-shape pattern is formed on the part of TFT 20. And, an opening hole 6 is formed on the gate insulating films 3, 4 of an end part of gate wiring 2. A picture element electrode 7 is formed by using transparent conductive body such as ITO, etc., and source wiring and source electrode 8a, and drain electrode 8b and package electrode are formed by using a metal such as aluminum.</p> |
