RESIST DEVELOPING DEVICE AND METHOD

摘要

PROBLEM TO BE SOLVED: To enable usage of a perfluoro carbon base solvent which exhibits a low surface tension and is suitable for final rinse for developing miniscule resist patterns without break, while ensuring environmental protection of the earth on an economically payable basis. SOLUTION: A processed substrate M to which resist patterns are transferred is placed on a substrate holding and rotating mechanism 2 in a developing cup 1 and is rotated. The substrate M is treated with developing liquid D and intermediate rinse R conveyed through a tube 9. The substrate M is then subjected to a final rinse with perfluoro carbon base solvent conveyed from a final rinse source 5 through a tube 10 and is dried with drying gas N sprayed on it for completing the development. Different liquids used for the above operations are stored in a separating bath 14. The perfluoro carbon base solvent exhibiting the largest specific gravity is stored in the bottom and separated. The solvent is then passed through a purifying bath 16 and a filter 18 and is recovered in the final rinse source 5 for reuse as a final rinse.