| 摘要 |
PROBLEM TO BE SOLVED: To peel resist modified product formed during etching and a side wall protection film at a low temperature and a short time by mixing aprotic polar solvent, water, fluoride and quaternary ammonium salt or hydroxylamine. SOLUTION: The composition is prepared by mixing aprotic polar solvent, water, fluoride and quaternary ammonium salt or hydroxylamine. The suitable mixing rate is aprotic polar solvent at 5 to 90 wt.%, water at 1 to 70 wt.%, fluoride at 0.01 to 20 wt.% and quaternary ammonium salt or hydroxylamines at 0.01 to 20 wt.%. Embodiments of aprotic polar solvent are dimethyl sulfoxide, N-methyl-2-pyrolidone, etc., and concrete examples of fluoride are ammonium fluoride, etc., and embodiments of quaternary ammonium salt are tetramethyl ammonium hydroxide, etc. |
