发明名称 METHOD AND APPARATUS FOR X-RAY DIFFRACTION MICROSCOPY
摘要 <p>PROBLEM TO BE SOLVED: To provide an X-ray diffraction microscope apparatus by which a large sample crystal can be tested without increasing the distance between the sample crystal and an X-ray source. SOLUTION: An X-ray diffraction microscope apparatus is provided with a plurality of X-ray sources 1, 18 as dotlike focuses and with a photographic plate 6 which is used to record diffraction X-rays on the crystal face of a sample crystal 4. Radiating X-ray beams which are generated from the respective X-ray sources are passed through a slit 3 which limits a beam width in the horizontal direction so as to irradiate the crystal face of the sample crystal 4, and the intensity distribution of the diffraction X-rays corresponding to the whole crystal face is recorded on the photographic plate 6. The radiating X-ray beams, from the respective X-ray sources, which are passed through the slit 3 are made continuous in the vertical direction on the crystal face of the sample crystal 4, and the whole crystal face of the sample crystal 4 is scanned by the beams.</p>
申请公布号 JPH1114562(A) 申请公布日期 1999.01.22
申请号 JP19970166089 申请日期 1997.06.23
申请人 NEC CORP 发明人 KIMURA SHIGERU
分类号 G01N23/203;G01N23/20;G01N23/207;G02B21/00;(IPC1-7):G01N23/203 主分类号 G01N23/203
代理机构 代理人
主权项
地址