| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a method for pre-alignment searching which allows alignment in alignment of a photo mask with a wafer, even when pre-alignment precision is so poor as to present no reference mark in a recognition range. SOLUTION: Relating to an alignment devise wherein, by observing through left and right field of views, a sample (wafer) is pre-aligned based on a reference mark, the image and relative positional relationship of the reference mark in the left and right field of views in correct alignment are registered (S1), and a desired sample is located on the device (S2). Then, by utilizing a pattern matching method for mutual relationship, the reference marks in the left and right field of views are detected (S3), detection status of the reference mark in the left field of view or the right field of view is judged (S4, S5, S6), alignment is performed as it is for such sample as the reference marks are in the left and right field of views (S7), and pre-alignment search is performed by such appropriate moving method as rotational, and parallel displacement when the reference mark is not at least in the left or right field of view (S8, S9, S10), then alignment is performed.</p> |
