| 摘要 |
PROBLEM TO BE SOLVED: To make it possible to achieve an improvement in resolution of an isolated pattern and dense patterns by using a same mask, by providing the same mask with functions of a spatial frequency modulated phase shift mask and a half-tone phase shift mask. SOLUTION: A translucent phase shift film 2 and a shielding film 3 are laminated on a glass substrate 1. Exposure light 4, 5 passing through a transparent part in an area 8 of a spatial frequency modulated phase shift mask part have an opposite phase to each other (b). Therefore, the exposure light interfere each other in the neighborhood of both patterns, and result in showing a steeply varying light intensity distribution, which shows an excellent resolution characteristic (c). Further, since exposure light 6 passing through the translucent film 2 in an area 9 of a half tone phase shift mask part has an opposite phase to exposure light 7 passing through the transparent part (b), it acts to suppress the skirt of the light intensity distribution of the exposure light 7 passing through the transparent part, and that enables to obtain a steeply varying light intensity distribution. |
