| 摘要 |
PROBLEM TO BE SOLVED: To improve throughput by housing a reticle whose frequency in use is high, in a slot close to a reticle stage. SOLUTION: Plural reticles are housed in reticle libraries 10 to 12. A reticle changer 19 is provided on the reticle stage 18 of a projection exposing system, and the plural reticles used in the projection exposing of one kind are set in the changer 19. A carrying device carries the reticle between the libraries 10 to 12 and the changer 19. By calculating the frequency in use for the reticle, the housing positions of the reticles inside the libraries 10 to 12 are changed so that carrying time to the stage 18 becomes short as the calculated frequency of the reticle is high. |
