发明名称 |
COMPOSITION AND METHOD FOR POLISHING A COMPOSITE COMPRISING TITANIUM |
摘要 |
Aqueous slurries are provided, which are useful for the chemical-mechanical polishing of substrates comprising titanium, comprising: water, submicron abrasive particles, an oxidizing agent, and a mono-, di-, or tri-substituted phenol wherein at least one of the substituted functional groups is polar. Optionally the compositions may also comprise a coumpound to suppress the rate of removal of silica. The slurries are useful on substrates which also comprise tungsten, aluminum or copper.
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申请公布号 |
WO9902623(A1) |
申请公布日期 |
1999.01.21 |
申请号 |
WO1998US13991 |
申请日期 |
1998.07.07 |
申请人 |
RODEL HOLDINGS, INC. |
发明人 |
WANG, HUEY, MING;WU, GUANGWEI;COOK, LEE, MELBOURNE |
分类号 |
B24B37/00;C09G1/02;C09K3/14;H01L21/304;H01L21/3105;H01L21/321;(IPC1-7):C09K13/00;C09K13/02 |
主分类号 |
B24B37/00 |
代理机构 |
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代理人 |
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主权项 |
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