发明名称 Semiconductor device with low parasitic capacitance
摘要 A method of fabricating a semiconductor device having active components grown on a substrate, involves providing a semiconductor substrate on which the active components are grown, and doping the semiconductor substrate to render it non conductive and thereby reduce parasitic capacitance between active components thereon. The components typically comprise a VCSEL and monitor. The doped substrate reduces parasitic capacitance.
申请公布号 GB9826227(D0) 申请公布日期 1999.01.20
申请号 GB19980026227 申请日期 1998.12.01
申请人 MITEL SEMICONDUCTOR AB 发明人
分类号 H01L21/76;H01L33/00;H01S5/022 主分类号 H01L21/76
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