发明名称
摘要 The invention relates to radiosensitive polymers and positive-working recording materials produced therewith. The polymer chain of the radiosensitive polymers contains both acid-labile groups and onium salt groupings having nonnucleophilic counterions. These radiosensitive polymers are suitable for producing semiconductor devices.
申请公布号 JP2848669(B2) 申请公布日期 1999.01.20
申请号 JP19900105481 申请日期 1990.04.23
申请人 BEE AA ESU EFU AG 发明人 RAINHORUTO SHUARUMU
分类号 C08G75/00;G03F7/004;G03F7/039;G03F7/075;H01L21/027;H01L21/30;(IPC1-7):G03F7/004 主分类号 C08G75/00
代理机构 代理人
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