发明名称 Insulated gate bipolar transistor
摘要 An insulated gate bipolar transistor according to the present invention has a first and a second emitter regions. A diffusion region of the first conductive type is formed in the first emitter region of the second conductive type. The second emitter region has a region having a high concentration compared with the remaining portion of the second emitter region. The high concentration region is adjacent to the diffusion region and positioned towards the center of a first conductive type well. In addition, the junction depth of the high concentration region is similar to the diffusion region.
申请公布号 US5861638(A) 申请公布日期 1999.01.19
申请号 US19960760255 申请日期 1996.12.05
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 OH, KWANG-HOON
分类号 H01L29/74;H01L29/739;H01L29/749;H01L29/78;(IPC1-7):H01L29/74 主分类号 H01L29/74
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