Radiation-sensitive positive resist composition comprising a 1,2-quinone diazide compound, an alkali-soluble resin and a polyphenol compound

摘要

A positive resist composition which comprises a 1,2-quinone diazide compound and an alkali-soluble resin containing a polyphenol compound (I) of the general formula: X- alpha -H(I) wherein x is a group of the formula: <IMAGE> and alpha is a divalent group which comprises a repeating unit of the formula: <IMAGE> or <IMAGE> in which n is a number of not less than 1; a, b, c, d, e and f are the same or different and a number of 0-3, provided that d+f is not less than 1; R1, R2 and R3 are the same or different and a C1-C18 alkyl group, a C1-C18 alkoxy group, a carboxyl group or a halogen atom; R4 is a hydrogen atom, a C1-C18 alkyl group or an aryl group, which resist composition is sensitive to radiation and has good balance of sensitivity, resolving power and heat resistance.