| 发明名称 |
LSI mask pattern edit apparatus with contour line intensity distribution display method of resolution for lithography |
| 摘要 |
An intensity distribution display method of displaying a intensity distribution of electromagnetic waves or charged particle beams fallen on a sample, is characterized by comprising the step of displaying the intensity distribution with the use of contour lines defined by Ie/(1+axn/100), where Ie is a desired intensity value, a is a constant rate (%), and n is an integer. |
| 申请公布号 |
US5861866(A) |
申请公布日期 |
1999.01.19 |
| 申请号 |
US19970816676 |
申请日期 |
1997.03.13 |
| 申请人 |
KABUSHIKI KAISHA TOSHIBA |
发明人 |
INOUE, SOICHI;TANAKA, SATOSHI |
| 分类号 |
G03F1/08;G03F1/36;G03F1/68;G03F7/20;H01J37/317;H01L21/027;(IPC1-7):G09G5/36;G03F9/00;G03C5/00 |
主分类号 |
G03F1/08 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
|
| 地址 |
|
