发明名称 Method for forming an indium antimonide layer
摘要 A method forms an indium antimonide layer by a sequential evaporation for use as a magnetic sensing material having high electron mobility. The method includes the steps of: (a) preparing a substrate; (b) pre-heating the substrate (c) depositing an antimony layer on top of the substrate; (d) forming an indium layer on top of the antimony layer to thereby obtain a sequentially deposited layer, wherein the sequentially deposited layer includes the antimony and the indium layers; (e) providing a protection layer on top of the sequentially deposited layer; and (f) heat treating the sequentially deposited layer to force inter-diffusion of antimony and indium, thereby producing the indium antimonide layer.
申请公布号 US5861069(A) 申请公布日期 1999.01.19
申请号 US19970918871 申请日期 1997.08.26
申请人 SKM LIMITED 发明人 LEE, SEUNG-HO
分类号 C23C14/06;C23C14/16;C23C14/58;C23C28/02;H01L43/06;(IPC1-7):H01L21/24 主分类号 C23C14/06
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