| 摘要 |
At least one convex arcuate face (or concave arcuate face) is formed by photolithography on a photoresist layer formed on a surface of an optical device constituted from an optical material, and the surface of the optical device and the photoresist film are etched continuously or stepwise to form on the surface of the optical device at least one convex arcuate face (or concave arcuate face) similar to the convex arcuate face (or concave arcuate face) of the photoresist film. In case the optical material is polished into a mirror face, a photoresist film is formed on the polished face, and the polished face and the photoresist film are etched uniformly. An optical device obtained in this manner is used for a laser oscillator, a monolithic laser system, a non-linear optical device, a microlens, a ring laser and so forth. On the other hand, a plurality of reflecting portions are provided on each of a pair of opposing faces of a light transmitting optical material, and a reflecting portion of at least one of the faces is formed from a convex arcuate face formed on the surface of the light transmitting optical material. A zigzag optical path is formed between the reflecting portions of the opposing faces of the light transmitting optical material such that it couples the reflecting portions alternately to each other, thereby to obtain an optical device having a long optical path. The optical device is employed as a higher harmonic wave converting device for light of a high efficiency for a short wavelength laser apparatus.
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