发明名称 TARGET COMPOSED ESSENTIALLY OF MGO, AND ITS PRODUCTION
摘要 PROBLEM TO BE SOLVED: To improve strength, fracture toughness value, and thermal shock resistance and also to improve the orientation property and film-forming velocity of an MgO film formed by a sputtering method. SOLUTION: The target composed essentially of MgO is constituted by dispersing 1-25 vol.% of LaB6 grains 2 in an MgO matrix having crystalline grains 1 of 0.5-100 μm average crystalline grain size. This target can be produced by mixing an MgO powder and LaB6 powder wet, drying the resultant mixture by heating under reduced pressure, crushing the mixture dry, compacting the resultant dry-crushed powder mixture, and further sintering the resultant green compact at 1300-1650 deg.C.
申请公布号 JPH116058(A) 申请公布日期 1999.01.12
申请号 JP19970156393 申请日期 1997.06.13
申请人 MITSUBISHI MATERIALS CORP 发明人 TAKENOUCHI TAKEYOSHI;SHIMAMURA SHOICHI;HATAKEYAMA NAOKI
分类号 C04B35/04;C23C14/34 主分类号 C04B35/04
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