Transfer apparatus and vertical heat-processing system using the same

摘要

A vertical heat treatment system has a transfer apparatus for transferring semiconductor wafers and a cassette serving as a transport container for the semiconductor wafers. The transfer apparatus has a base disposed to be vertically movable and rotatable within a horizontal plane. Wafer arms for transferring the wafers placed on them are disposed on the base. The wafer arms can reciprocally move on the base between a standby position and an advanced position in the horizontal direction. A cassette arm for transferring a cassette placed on it is also disposed on the base. The cassette arm can reciprocally move on the base between a retreat position and a protruded position in the horizontal direction. The wafer arms and the cassette arm are reciprocally movable in opposite directions to oppose each other. While the wafer arms and the cassette arm are at the standby position and the retreat position, respectively, a holding portion of the cassette arm is present immediately above the wafer arms.