发明名称 |
Process to form mesostructured films |
摘要 |
This invention comprises a method to form a family of supported films film with pore size in the approximate range 0.8-20 nm exhibiting highly ordered microstructures and porosity derived from an ordered micellar or liquid-crystalline organic-inorganic precursor structure that forms during film deposition. Optically transparent, 100-500-nm thick films exhibiting a unique range of microstructures and uni-modal pore sizes are formed in seconds in a continuous coating operation. Applications of these films include sensors, membranes, low dielectric constant interlayers, anti-reflective coatings, and optical hosts. |
申请公布号 |
US5858457(A) |
申请公布日期 |
1999.01.12 |
申请号 |
US19970937407 |
申请日期 |
1997.09.25 |
申请人 |
SANDIA CORPORATION |
发明人 |
BRINKER, C. JEFFREY;ANDERSON, MARK T.;GANGULI, RAHUL;LU, YUNFENG |
分类号 |
B01J29/04;B01D71/02;B01J29/03;C01B37/00;C01B37/02;C01B39/02;C04B38/00;C04B41/45;C09C1/30;C23C18/12;(IPC1-7):B05D5/06 |
主分类号 |
B01J29/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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