| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a waste gas treating technology by which a waste gas exhausted from a semiconductor manufacturing process or the like is treated to decompose and remove a harmful material and a pollutant contained in the gas. SOLUTION: In a vacuum atmosphere A between plasma electrodes 20, 21, by generating plasma, while a waste gas exhausted from a semiconductor manufacturing process or the like is mixed with a reaction promoting gas, constituents in the waste gas are excited and activated together with the reaction promoting gas to react and on the electrode surface of the plasma electrodes 20, 21, they are deposited and solidified as a plasma reaction product. In this way, a harmful material and a pollutant in the waste gas are decomposed and removed.</p> |
