发明名称 |
Succinic acid derivative degradable chelants, uses and compositions thereof |
摘要 |
Polyamino disuccinic acids are effective chelants for use in photography and gas conditioning (both applications preferably involving the polyamino disuccinic acid in the form of a metal, preferably an iron complex). The copper chelates are also useful in electroless copper plating. In photography, the invention includes a method of bleaching or bleach-fixing a photographic material which comprises contacting said material with a bleaching solution containing a bleaching agent comprising a ferric complex of a polyamino disuccinic acid and the solution so used. In electroless desposition, the invention includes a method of electroless deposition of copper upon a non-metallic surface receptive to the deposited copper including a step of contacting the non-metallic surface with an aqueous solution comprising a soluble copper salt and a polyamino disuccinic acid and plating baths appropriate for such use. Another aspect of the invention includes a method for removing iron oxide deposits from a surface including a step of contacting the deposits with a solution comprising an ammoniated polyamino disuccinic acid. Yet another aspect of the invention involves gas conditioning including a process of removing H2S from a fluid comprising contacting said fluid with an aqueous solution at a pH suitable for removing H2S wherein said solution contains at least one higher valence polyvalent metal chelate of a polyamino disuccinic acid and a process of removing NOx from a fluid comprising contacting the fluid with an aqueous solution of at least one lower valence state polyvalent metal chelate of a polyamino disuccinic acid.
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申请公布号 |
US5859273(A) |
申请公布日期 |
1999.01.12 |
申请号 |
US19960735858 |
申请日期 |
1996.10.23 |
申请人 |
THE DOW CHEMICAL COMPANY |
发明人 |
WILSON, DAVID ALAN;CRUMP, DRUCE KIRK |
分类号 |
B01D53/14;B01D53/50;B01D53/52;B01D53/56;B01D53/64;C01B17/05;C23C18/38;G03C7/42;(IPC1-7):C07F15/02 |
主分类号 |
B01D53/14 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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