发明名称 Novolac polymer planarization films for microelectronic structures
摘要 An improved method for forming planarization films which remain adhered to substrates upon exposure to heat comprising first applying a polymeric solution containing a low molecular weight novolac resin, a surfactant selected from the group consisting of a non-fluorinated hydrocarbon, a fluorinated hydrocarbon and combinations thereof, and an optional organic solvent to a substrate, followed by heating the substrate.
申请公布号 US5858547(A) 申请公布日期 1999.01.12
申请号 US19940271291 申请日期 1994.07.06
申请人 ALLIEDSIGNAL, INC. 发明人 DRAGE, JAMES STEVEN
分类号 C08G8/10;C08G8/00;C08L61/06;C09D161/04;C09D161/06;H01L21/312;(IPC1-7):B32B13/12 主分类号 C08G8/10
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