发明名称 Plasma processing method
摘要 A method of plasma-processing which includes the step of plasma-processing a matter mounted on a component in a plasma processing vessel by using plasma gases, and the step of introducing an inactive gas into the plasma processing vessel when no plasma process is conducted in the vessel and gases resulted from the previous plasma process remain therein.
申请公布号 US5858258(A) 申请公布日期 1999.01.12
申请号 US19920817961 申请日期 1992.01.08
申请人 TOKYO ELECTRON LIMITED 发明人 KOJIMA, HIROSHI;TAHARA, YOSHIFUMI;ARAI, IZUMI
分类号 C23F4/00;H01J37/32;H01L21/3065;H01L21/311;(IPC1-7):H05H1/00;B05D5/00 主分类号 C23F4/00
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