发明名称 METHOD FOR EVALUATING ALIGNMENT ACCURACY FOR RESIST PATTERNING AND EVALUATION PATTERN
摘要 PROBLEM TO BE SOLVED: To enhance alignment accuracy at the time of resist-patterning. SOLUTION: Counter electrode parts R1 and R2 and probe electrode parts K1 and K2 extended from them are formed by a process to form metallic wiring film, and a dielectric part M partially laying over the counter electrode parts R1 and R2 is formed by the process to form layer-to-layer insulated film. Thus, a filling part (m) which is integrated with the dielectric part M fills up in an interstice between the counter electrode parts R1 and R2, so that a capacitor part CP is constituted. The interposition width of the filling part (m) between the counter electrode parts R1 and R2 possesses correlation with an alignment deviation value at the time of the resist-patterning, and the electric capacity of the capacitor part CP is changed in accordance with the interposition width of the filling part (m). The electric capacity is measured, so that the alignment accuracy at the time of the resist-patterning is evaluated.
申请公布号 JPH117140(A) 申请公布日期 1999.01.12
申请号 JP19970161706 申请日期 1997.06.18
申请人 SONY CORP 发明人 KAMIYA MASAYUKI
分类号 G01B7/00;G03F9/00;H01L21/027;H05K1/02;H05K1/11;H05K3/00;(IPC1-7):G03F9/00 主分类号 G01B7/00
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